فرایندهای فیلم نازک

Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process. Content: Front Matter , Page iii Copyright , Page iv List of Contributors , Pages ix-x Preface , Page xi I-1 - Introduction , Pages 3-7 II-1 - Glow Discharge Sputter Deposition , Pages 11-73 II-2 - Cylindrical Magnetron Sputtering , Pages 75-113 II-3 - The Sputter and S-Gun Magnetrons , Pages 115-129 II-4 - Planar Magnetron Sputtering , Pages 131-173 II-5 - Ion Beam Deposition , Pages 175-206 III-1 - Deposition of Inorganic Films from Solution , Pages 209-256 III-2 - Chemical Vapor Deposition of Inorganic Thin Films , Pages 257-331 IV-1 - Plasma Deposition of Inorganic Thin Films , Pages 335-360 IV-2 - Glow Discharge Polymerization , Pages 361-398 V-1 - Chemical Etching , Pages 401-496 V-2 - Plasma-Assisted Etching Techniques for Pattern Delineation , Pages 497-556 Index , Pages 557-564