The Chemical Physics of Solid Surfaces and Heterogeneous Catalysis: Growth and properties of ultrathin epitaxial layers

Although there has been steady progress in understanding aspects of epitaxial growth throughout the last 30 years of modern surface science, work in this area has intensified greatly in the last 5 years. A number of factors have contributed to this expansion. One has been the general trend in surface science to tackle problems of increasing complexity as confidence is gained in the methodology, so for example, the role of oxide/metal interfaces in determining the properties of many practical supported catalysts is now being explored in greater detail. A second factor is the recognition of the potential importance of artificial multilayer materials not only in semiconductor devices but also in metal/metal systems because of their novel magnetic properties. Perhaps even more important than either of these application areas, however, is the newly-discovered power of scanning probe microscopies, and most notably scanning tunneling microscopy (STM), to provide the means to study epitaxial growth phenomena on an atomic scale under a wide range of conditions. These techniques have also contributed to revitalised interest in methods of fabricating and exploiting artificial structures (lateral as well as in layers) on a nanometre scale. This volume, on Growth and Properties of Ultrathin Epitaxial Layers , includes a collection of articles which reflects the present state of activity in this field. The emphasis is on metals and oxides rather than semiconductors. Content: Contributors to volume 8 Pages v-viii Preface Pages ix-x D.A. King, D.P. Woodruff Chapter 1 Surface processes in epitaxial growth Original Research Article Pages 1-45 John A. Venables Chapter 2 The many facets of metal epitaxy Original Research Article Pages 46-65 E. Bauer Chapter 3 Epitaxial growth modes far from equilibrium Original Research Article Pages 66-101 Georg Rosenfeld, Bene Poelsema, George Comsa Chapter 4 Dynamics and diffusion of atoms at stepped surfaces Original Research Article Pages 102-148 Tien T. Tsong, Chonglin Chen Chapter 5 Heteroepitaxial metal growth: the effects of strain Original Research Article Pages 149-206 Harald Brune, Klaus Kern Chapter 6 Surface alloying in heteroepitaxial metal-on-metal growth Original Research Article Pages 207-257 F. Besenbacher, L. Pleth Nielsen, P.T. Sprunger Chapter 7 Epitaxial growth of Si on Si(001) Original Research Article Pages 258-296 Feng Liu, M.G. Lagally Chapter 8 Monolayer films of unreactive metals on semiconductors Original Research Article Pages 297-339 G. Le Lay Chapter 9 Structure and electronic properties of ultrathin oxide films on metallic substrates Original Research Article Pages 340-374 H. Kuhlenbeck, H.-J. Freund Chapter 10 Chemical and spectroscopic studies of ultrathin oxide films Original Research Article Pages 375-406 S.C. Street, D.W. Goodman Chapter 11 Growth, structure and reactivity of ultrathin metal films on TiO 2 surfaces Original Research Article Pages 407-447 Rajendra Persaud, Theodore E. Madey Chapter 12 Intrinsic stress of epitaxial thin films and surface layers Original Research Article Pages 448-489 R. Koch Chapter 13 Density-functional theory of epitaxial growth of metals Original Research Article Pages 490-544 P. Ruggerone, C. Ratsch, M. Scheffler Chapter 14 Electronic structure of ultrathin magnetic films Original Research Article Pages 545-582 Peter D. Johnson Chapter 15 Ultrathin magnetic structures—magnetism and electronic properties Original Research Article Pages 583-634 J.A.C. Bland Index Pages 635-650 Although there has been steady progress in understanding aspects of epitaxial growth throughout the last 30 years of modern surface science, work in this area has intensified greatly in the last 5 years. A number of factors have contributed to this expansion. One has been the general trend in surface science to tackle problems of increasing complexity as confidence is gained in the methodology, so for example, the role of oxide/metal interfaces in determining the properties of many practical supported catalysts is now being explored in greater detail. A second factor is the recognition of the potential importance of artificial multilayer materials not only in semiconductor devices but also in metal/metal systems because of their novel magnetic properties. Perhaps even more important than either of these application areas, however, is the newly-discovered power of scanning probe microscopies, and most notably scanning tunneling microscopy (STM), to provide the means to study epitaxial growth phenomena on an atomic scale under a wide range of conditions. These techniques have also contributed to revitalised interest in methods of fabricating and exploiting artificial structures (lateral as well as in layers) on a nanometre scale. This volume, on Growth and Properties of Ultrathin Epitaxial Layers, includes a collection of articles which reflects the present state of activity in this field. The emphasis is on metals and oxides rather than semiconductors v. 1. Clean solid surfaces v. 2. Adsorption at solid surfaces v. 3. Chemisorption systems, pts. A-B v. 4. Fundamental studies of heterogeneous catalysis v. 5. Surface properties of electronic materials v. 6. Coadsorption, promoters and poisons v. 7. Phase transitions and adsorbate restructuring at metal surfaces v. 8. Growth and properties of ultrathin epitaxial layers v. 9. Oxide surfaces