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Semiconductors and Semimetals Volume 72 Silicon Epitaxy (Semiconductors and Semimetals)

معرفی کتاب «Semiconductors and Semimetals Volume 72 Silicon Epitaxy (Semiconductors and Semimetals)» نوشتهٔ Danilo Crippa, Daniel L. Rode and Maurizio Masi (Eds.)، منتشرشده توسط نشر Elsevier در سال 2001. این کتاب در فرمت pdf، زبان انگلیسی ارائه شده است.

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon , and others promise that this tradition will be maintained and even expanded. Content: Preface Pages xv-xvii Danilo Crippa, Daniel L. Rode, Maurizio Masi List of contributors Pages xix-xx Chapter 1 CVD technologies for silicon: A quick survey Original Research Article Pages 1-50 A.M. Rinaldi, D. Crippa Chapter 2 Epitaxial growth theory: Vapor-phase and surface chemistry Original Research Article Pages 51-88 C. Cavallotti, M. Masi Chapter 3 Epitaxial growth facilities, equipment, and supplies Original Research Article Pages 89-125 V. Pozzetti Chapter 4 Epitaxial growth techniques: Low-temperature epitaxy Original Research Article Pages 127-149 J. Murota Chapter 5 Epitaxial growth techniques: Molecular beam epitaxy Original Research Article Pages 151-183 Y. Shiraki Chapter 6 Epitaxial growth modeling Original Research Article Pages 185-224 M. Masi, S. Kommu Chapter 7 Epitaxial layer characterization and metrology Original Research Article Pages 225-276 V.-M. Airaksinen Chapter 8 Epitaxy for discrete and power devices Original Research Article Pages 277-293 G. Beretta Chapter 9 Epitaxy on patterned wafers Original Research Article Pages 295-343 S. Acerboni Chapter 10 Si-Based alloys: SiGe and SiGe:C Original Research Article Pages 345-395 D.J. Meyer Chapter 11 Silicon epitaxy: New applications Original Research Article Pages 397-457 D. Dutartre Index Pages 459-470 Contents of volumes in this series Pages 471-491 This book is intended to serve as quick reference handbook on so-called designer drugs. These new, mainly synthetic compounds are also often referred to as analogues of controlled substances. This new work provides a unique directory of 104 designer drugs. This class of drugs is rapidly growing in variety and number of compounds. Although identification, toxicology and other properties have been thoroughly investigated, their analogues and derivatives remain poorly documented. This book fills the gap. Data which is available is often contradictory and confused. This directory provides a critic
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