Secondary Ion Mass Spectrometry Sims V: Proceedings Of The Fifth International Conference, Washington, Dc, September 30 - October 4, 1985 (springer Series In Chemical Physics)

Front Matter....Pages I-XXI Front Matter....Pages 1-1 The Growth of Secondary Ion Mass Spectrometry (SIMS): A Personal View of Its Development....Pages 2-15 Front Matter....Pages 17-17 Density-Functional Studies of the Atom-Surface Interaction and the Ionization Probability of Sputtered Atoms....Pages 18-25 Origin of the Chemical Enhancement of Positive Secondary Ion Yield in SIMS....Pages 26-28 Ion Pair Production as Main Process of SIMS for Inorganic Solids....Pages 29-31 Sputtering and Secondary Ion Emission From Metals and Alloys Subjected to Oxygen Ion Bombardment....Pages 32-37 Measurements of the SIMS Isotope Effect....Pages 38-40 SIMS Study of Self-Diffusion in Liquid Tin and of Associated Isotope Effects....Pages 41-44 Silicon-Induced Enhancement of Secondary Ion Emission in Silicates: A Study of the Matrix Effects....Pages 45-47 Ionization Probabilities of Polycrystalline Metal Surfaces....Pages 48-50 Reactivity and Structure of Sputtered Species....Pages 51-53 Local Thermal Equilibrium Model of Molecular Secondary Ion Emission....Pages 54-56 Time-of-Flight Investigations of Secondary Ion Emission from Metal Halides....Pages 57-59 Multicharged Secondary Ions from Light Metals (Mg, Al, Si)....Pages 60-62 Population of Ion Clusters Sputtered from Metallic Elements with 10 keV Ar + ....Pages 63-65 Ejection and Ionization Efficiencies in Electron and Ion-Stimulated Desorption from Covalently Bound Surface Structures....Pages 66-68 Front Matter....Pages 69-69 Electron Gas SNMS....Pages 70-74 Glow Discharge Mass Spectrometry....Pages 75-78 Electron Beam Postionization of Sputtered Neutrals....Pages 79-84 General Postionization of Sputtered and Desorbed Species by Intense Untuned Radiation....Pages 85-89 Multi-Photon Resonance Ionization of Emitted Particles....Pages 90-93 Front Matter....Pages 69-69 Post-Ionization of Sputtered Particles: A Brief Review....Pages 94-102 Quantitatve Analysis Using Sputtered Neutrals in an Ion Microanalyser....Pages 103-104 Quantitative Analysis of Iron and Steel by Mass Spectrometry....Pages 105-107 Ion Microprobe Mass Spectrometry Using Sputtering Atomization and Resonance Ionization....Pages 108-110 Front Matter....Pages 111-111 Memory Effects in Quadrupole SIMS....Pages 112-114 Correction for Residual Gas Background in SIMS Analysis....Pages 115-117 Cross — Calibration of SIMS Instruments for Analysis of Metals and Semiconductors....Pages 118-120 On-Line Ion Implantation: The SIMS Primary Ion Beam for Creation of Empirical Quantification Standards....Pages 121-123 Matrix Effects in the Quantitative Elemental Analysis of Plastic-Embedded and Ashed Biological Tissue by SIMS....Pages 124-126 Reproducible Quantitative SIMS Analysis of Semiconductors in the Cameca IMS 3F....Pages 127-129 Front Matter....Pages 131-131 Imaging SIMS at 20 nm Lateral Resolution: Exploratory Research Applications....Pages 132-138 Use of a Compact Cs Gun Together with a Liquid Metal Ion Source for High Sensitivity Submicron SIMS....Pages 139-141 Secondary Ion Mass Spectrometer with Liquid Metal Field Ion Source and Quadrupole Mass Analyzer....Pages 142-145 Evaluation of a New Cesium Ion Source for SIMS....Pages 146-148 Survey of Alkali Primary Ion Sources for SIMS....Pages 149-151 Non-Oxygen Negative Primary Ion Beams for Oxygen Isotopic Analysis in Insulators....Pages 152-154 A New SIMS Instrument: The Cameca IMS 4F....Pages 155-157 The Emission Objective Lens Working as an Electron Mirror: Self Regulated Potential at the Surface of an Insulating Sample....Pages 158-160 20 K-Cryopanel-Equipped SIMS Instrument for Analysis Under Ultrahigh Vacuum....Pages 161-163 Improvement of an Ion Microprobe Mass Analyzer (IMMA)....Pages 164-166 Front Matter....Pages 131-131 A High-Performance Analyzing System for SIMS....Pages 167-169 Characterization of Electron Multipliers by Charge Distributions....Pages 170-172 Automated Collection of SIMS Data with Energy Dispersive X-Ray Analysis Hardware....Pages 173-175 Software and Interfaces for the Automatic Operation of a Quadrupole SIMS Instrument....Pages 176-178 Computer-Aided Design of Primary and Secondary Ion Optics for A Quadrupole SIMS Instrument....Pages 179-181 Time-of-Flight Instrumentation for Laser Desorption, Plasma Desorption and Liquid SIMS....Pages 182-184 Coincidence Measurements with the Manitoba Time-of-Flight Mass Spectrometer....Pages 185-187 High Resolution TOF Secondary Ion Mass Spectrometer....Pages 188-190 Front Matter....Pages 191-191 Evaluation of Accelerator-based Secondary Ion Mass Spectrometry for the Ultra-trace Elemental Characterization of Bulk Silicon....Pages 192-194 Quantitative Analysis with Laser Microprobe Mass Spectrometry....Pages 195-197 Laser-Probe Microanalysis: Aspects of Quantification and Applications in Materials Science....Pages 198-200 Some Aspects of Laser-Ionisation Mass-Analysis (LIMA) in Semiconductor Processing....Pages 201-203 Front Matter....Pages 205-205 The Use of SSIMS and ISS to Examine Pt/TiO 2 Surfaces....Pages 206-209 Secondary Ion and Auger Electron Emission by Ar + Ion Bombardment on Al-Fe Alloys....Pages 210-212 Characterization of Planar Model Co-Mo/γ-Al 2 O 3 Catalysts by SIMS, ESCA, and AES....Pages 213-215 Search for SiO 2 in Commercial SiC....Pages 216-218 SIMS/XPS Studies of Surface Reactions on Rh(111) and Rh(331)....Pages 219-221 SSIMS — A Powerful Tool for the Characterisation of the Adsorbate State of CO on Metallic and Bimetallic Surfaces....Pages 222-224 Energy and Angle-Resolved SIMS Studies of Cl 2 Adsorption on Ag{110}; Evidence for Coverage Dependent Electronic Structure Rearrangements....Pages 225-227 Molecular Secondary Ion Emission from Different Amino Acid Adsorption States on Metals....Pages 228-230 Front Matter....Pages 231-231 A High-Resolution, Single Ion Sensitivity Video System for Secondary Ion Microscopy....Pages 232-234 Dynamic Range Consideration for Digital Secondary Ion Image Depth Profiling....Pages 235-238 Digital Slit Imaging for High-Resolution SIMS Depth Profiling....Pages 239-241 Lateral Elemental Distributions on a Corroded Aluminum Alloy Surface....Pages 242-244 Improved Spatial Resolution of the CAMECA IMS-3f Ion Microscope....Pages 245-248 Video Tape System for Ion Imaging....Pages 249-252 Application of a Framestore Datasystem in Imaging SIMS....Pages 253-256 Chemical Characterisation of Insulating Materials Using High Spatial Resolution SSIMS — An Analysis of the Problems and Possible Solutions....Pages 257-260 Application of Digital SIMS Imaging to Light Element and Trace Element Mapping....Pages 261-263 SIMS Imaging of Silicon Defects....Pages 264-267 Front Matter....Pages 269-269 Quantitative SIMS Depth Profiling of Semiconductor Materials and Devices....Pages 270-278 High-Accuracy Depth Profiling in Silicon to Refine SUPREM-III Coefficients for B, P, and As....Pages 279-281 The Use of Silicon Structures with Rapid Doping Level Transitions to Explore the Limitations of SIMS Depth Profiling....Pages 282-284 Temperature Dependent Broadening Effects in Oxygen SIMS Depth Profiling....Pages 285-287 Sputter-Induced Segregation of As in Si During SIMS Depth Profiling....Pages 288-290 SIMS Measurements of As at the SiO 2 /Si Interface....Pages 291-294 Elimination of Ion-Bombardment Induced Artefacts in Compound Identification During Thin Film Analysis: Detection of Interface Carbides in “Diamond-Like” Carbon Films on Silicon....Pages 295-298 Gibbsian Segregation During the Depth Profiling of Copper in Silicon....Pages 299-302 Species-Specific Modification of Depth Resolution in Sputtering Depth Profiles by Oxygen Adsorption....Pages 303-305 Selective Sputtering and Ion Beam Mixing Effects on SIMS Depth Profiles....Pages 306-309 Front Matter....Pages 269-269 The Effect of Temperature on Beam-Induced Broadening in SIMS Depth Profiling....Pages 310-312 Variable Angle SIMS....Pages 313-315 Dependence of Sputter Induced Broadening on the Incident Angle of the Primary Ion Beam....Pages 316-318 SIMS Depth Profiling with Oblique Primary Beam Incidence....Pages 319-322 Deterioration of Depth Resolution in Sputter Depth Profiling by Raster Scanning an Ion Beam at Oblique Incidence and Constant Slew Rate....Pages 323-326 SIMS Analysis of Contamination Due to Ion Implantation....Pages 327-330 Analysis of Surface Contamination from Chemical Cleaning and Ion Implantation....Pages 331-333 Quantification of SIMS Dopant Profiles in High-Dose Oxygen-Implanted Silicon, Using a Simple Two-Matrix Model....Pages 334-336 Isotope Tracer Studies Using SIMS....Pages 337-339 High Dynamic Range SIMS Depth Profiles for Aluminium in Silicon-on-Sapphire....Pages 340-342 Charge Compensation During SIMS Depth Profiling of Multilayer Structures Containing Resistive and Insulating Layers....Pages 343-346 Ion Deposition Effects in and Around Sputter Craters Formed by Cesium Primary Ions....Pages 347-349 SIMS Depth Profiling of Si in GaAs....Pages 350-352 High Purity III–V Compound Analyses by Modified CAMECA IMS 3F....Pages 353-356 Depth Profiling of Dopants in Aluminum Gallium Arsenide....Pages 357-359 Depth Resolution in Profiling of Thin GaAs-GaAlAs Layers....Pages 360-362 Elemental Quantification Through Thin Films and Interfaces....Pages 363-365 Matrix Effect Quantification for Positive SIMS Depth Profiling of Dopants in InP/InGaAsP/InGaAs Epitaxial Heterostructures....Pages 366-370 A Comparison of Electron-Gas SNMS, RBS and AES for the Quantitative Depth Profiling of Microscopically Modulated Thin Films....Pages 371-373 Characterization of Silicides by the Energy Distribution of Molecular Ions....Pages 374-376 Front Matter....Pages 269-269 Investigation of Interfaces in a Ni/Cr Multilayer Film with Secondary Ion Mass Spectrometry....Pages 377-379 Sputter Depth Profiles in an Al-Cr Multilayer Sample....Pages 380-383 SIMS Depth Profiling of Multilayer Metal-Oxide Thin Films — Improved Accuracy Using a Xenon Primary Beam....Pages 384-386 Front Matter....Pages 387-387 Metallurgical Applications of SIMS....Pages 388-393 Sputtering of Au-Cu Thin Film Alloys....Pages 394-396 Hydrogen Profiling in Titanium....Pages 397-399 The Application of SIMS and Other Techniques to Study the Anodized Surface of a Magnesium Alloy....Pages 400-402 Incorporation of Chromium in Sputtered Copper Films and Its Removal During Wet Chemical Etching....Pages 403-404 Applications of SIMS to the Study of a Corrosion Process — Oxidation of Uranium by Water....Pages 405-408 SIMS Trace Detection of Heavy Elements in High-Speed Rotors....Pages 409-411 Quantitative Analysis of Zn-Fe Alloy Electrodeposit on Steel by Secondary Ion Mass Spectrometry....Pages 412-414 SIMS Analysis of Zn-Fe Alloy Galvanized Layer....Pages 415-418 Front Matter....Pages 419-419 Biological Microanalysis Using SIMS — A Review....Pages 420-425 Observations Concerning the Existence of Matrix Effects in SIMS Analysis of Biological Specimens....Pages 426-428 Ion Microanalysis of Frozen-Hydrated Cultured Cells....Pages 429-431 Imaging Intracellular Elemental Distribution and Ion Fluxes in Cryofractured, Freeze-Dried Cultured Cells Using Ion Microscopy....Pages 432-434 Cellular Microlocalization of Mineral Elements by Ion Microscopy in Organisms of the Pacific Ocean....Pages 435-437 Quantitative SIMS of Prehistoric Teeth....Pages 438-442 Front Matter....Pages 443-443 Ion Microprobe Studies of the Magnesium Isotopic Abundance in Allende and Antarctic Meteorites....Pages 444-446 Front Matter....Pages 447-450 Rock and Mineral Analysis by Accelerator Mass Spectrometry....Pages 443-443 Front Matter....Pages 451-454 Organic Secondary Ion Mass Spectrometry: Theory, Technique, and Application....Pages 455-455 Mechanisms of Organic Molecule Ejection in SIMS and FABMS....Pages 456-461 A Thermodynamic Description of 252-Cf-Plasma Desorption....Pages 462-466 Laser Desorption Mass Spectrometry. A Review....Pages 467-470 Time-of-Flight Measurements in Secondary Ion Mass Spectrometry....Pages 471-475 Fast Atom Bombardment Mass Spectrometry of Biomolecules....Pages 476-479 Solid Sample-SIMS on Biomolecules with Fast Ion Beams from the Uppsala EN-Tandem Accelerator....Pages 480-483 Fourier Transform Mass Spectrometry for High Mass Applications....Pages 484-487 Front Matter....Pages 488-491 Energy Distribution of Secondary Organic Ions Emitted by Amino Acids....Pages 493-493 Analytical Application of a High Performance TOF-SIMS....Pages 494-496 Organic Secondary Ion Intensity and Analyte Concentration....Pages 497-499 Characteristics of Ion Emission in Desorption Ionization Mass Spectrometry....Pages 500-502 Some Aspects of the Chemistry of Ionic Organo-Alkali Metal Halide Clusters Formed by Desorption Ionization....Pages 503-505 Detection of Biomolecules by Derivatization/SIMS....Pages 506-508 Solvent Selection and Modification for FAB Mass Spectrometry....Pages 509-511 The Use of Negative Ion Fast Atom Bombardment Mass Spectrometry for the Detection of Esterfield Fatty Acids in Biomolecules....Pages 512-514 Application of Fast Atom Bombardment and Tandem Mass Spectrometry to the Differentiation of Isomeric Molecules of Biological Interest....Pages 515-517 Front Matter....Pages 518-520 Fragmentation of Heavy Ions (5000 to 7000 Daltons) Generated by PD and FAB....Pages 521-523 Amino Acid Sequencing of Norwegian Fresh Water Blue-Green Algal (Microcystis Aeruginosa) Peptide by FAB-MS/MS Technique....Pages 524-526 Static SIMS Studies of Molecular and Macromolecular Surfaces: Ion Formation Studies....Pages 493-493 TOF-SIMS of Polymers in the Range of M/Z = 500 to 5000....Pages 527-530 Secondary Ion Mass Spectrometry of Modified Polymer Films....Pages 531-533 Application of SIMS Technique to Industrially Used Organic Materials....Pages 534-537 Empirical Study of Primary Ion Energy Compared with the Abundance of Polymer Fragment Ion....Pages 538-541 Comparison of Laser Mass Spectra Obtained at Ambient Conditions vs. Sample Freezing....Pages 542-544 Surface Analysis by Laser Desorption of Neutral Molecules with Fourier Transform Mass Spectrometry Detection....Pages 545-547 ....Pages 548-550 This volume contains the proceedings of the Fifth International Confer ence on Secondary Ion Mass Spectrometry (SIMS V), held at the Capitol Holiday Inn, Washington, DC, USA, from September 30 to October 4, 1985. The conference was the fifth in a series of conferences held bienni ally. Previous conferences were held in Miinster (1977), Stanford (1979), Budapest (1981), and Osaka (1983). SIMS V was organized by Dr. R.J. Colton of the Nayal Research Lab oratory and Dr. D.S. Simons of the National Bureau of Standards un der the auspices of the International Organizing Committee chaired by Prof. A. Benninghoven of the Universitat Miinster. Dr. Richard F.K. Herzog served as the honorary chairman of SIMS V. While Dr. Herzog is best known to the mass spectrometry community for his theoretical development of a mass spectrometer design, known as the Mattauch-Herzog geometry, he also made several early and impor tant contributions to SIMS. In 1949, Herzog and Viehbock published a description of the first instrument designed to study secondary ions pro duced by bombardment from a beam of ions generated in a source that was separated from the sample by a narrow tube. Later at the GCA Cor poration, he brought together a team of researchers including H.J. Liebl, F.G. Riidenauer, W.P. Poschenrieder and F.G. Satkiewicz, who designed and built, and carried out applied research with the first commercial ion microprobe