PVD for Microelectronics: Sputter Deposition Applied to Semiconductor Manufacturing (Thin Films) (Volume 26)
معرفی کتاب «PVD for Microelectronics: Sputter Deposition Applied to Semiconductor Manufacturing (Thin Films) (Volume 26)» نوشتهٔ Ronald A. Powell, Stephen Rossnagel، منتشرشده توسط نشر Academic Press در سال 1999. این کتاب در 3 صفحه، فرمت pdf، زبان انگلیسی ارائه شده است.
GENERAL DESCRIPTION OF THE SERIES Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. GENERAL DESCRIPTION OF THE VOLUME This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts. GENERAL DESCRIPTION OF THE SERIES
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
GENERAL DESCRIPTION OF THE VOLUME
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts. The physical process tat we now call sputtering was first reported in 1852 by Sir William Robert Grove [1.1], who described the effect as "cathodic disintegration."
دانلود کتاب PVD for Microelectronics: Sputter Deposition Applied to Semiconductor Manufacturing (Thin Films) (Volume 26)
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
GENERAL DESCRIPTION OF THE VOLUME
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts. The physical process tat we now call sputtering was first reported in 1852 by Sir William Robert Grove [1.1], who described the effect as "cathodic disintegration."