Precursor Chemistry of Advanced Materials: CVD, ALD and Nanoparticles (Topics in Organometallic Chemistry) (Topics in Organometallic Chemistry)

Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors. Gas-phase Thermochemistry And Mechanism Of Organometallic Tin Oxide Cvd Precursors / M.d. Allendorf [and Others] -- Materials Chemistry Of Group 13 Nitrides / A. Devi [and Others] -- Single-source-precursor Cvd: Alkoxy And Siloxy Aluminum Hydrides / M. Veith -- Cvd Deposition Of Binary Alsb And Gasb Material Films -- A Single-source Approach / S. Schulz -- Organometallic Precursors For Atomic Layer Deposition / M. Putkonen [and Others] -- Surface Reactivity Of Transition Metal Cvd Precursors: Towards The Control Of The Nucleation Step / P. Serp [and Others] -- Organometallic And Metallo-organic Precursors For Nanoparticles / M.a. Malik [and Others]. Volume Editor: Roland A. Fischer ; With Contributions By M.d. Allendorf ... [et Al.]. Includes Bibliographical References And Index. Gas-phase thermochemistry and mechanism of organometallic tin oxide CVD precursors / M.D. Allendorf ... [et al.] Materials chemistry of group 13 nitrides / A. Devi ... [et al.] Single-source-precursor CVD: Alkoxy and siloxy aluminum hydrides / M. Veith CVD deposition of binary AlSb and GaSb material films a single-source approach / S. Schulz Organometallic precursors for atomic layer deposition / M. Putkonen ... [et al.] Surface reactivity of transition metal CVD precursors: Towards the control of the nucleation step / P. Serp ... [et al.] Organometallic and metallo-organic precursors for nanoparticles / M.A. Malik ... [et al.]. Gas-Phase Thermochemistry and Mechanism of Organometallic Tin Oxide CVD Precursors....Pages 1-48 Materials Chemistry of Group 13 Nitrides....Pages 49-80 Single-Source-Precursor CVD: Alkoxy and Siloxy Aluminum Hydrides....Pages 81-100 CVD Deposition of Binary AlSb and GaSb Material Films -- a Single-Source Approach....Pages 101-123 Organometallic Precursors for Atomic Layer Deposition....Pages 125-145 Surface Reactivity of Transition Metal CVD Precursors: Towards the Control of the Nucleation Step....Pages 147-171 Organometallic and Metallo-Organic Precursors for Nanoparticles....Pages 173-204