Porous Silicon Carbide and Gallium Nitride : Epitaxy, Catalysis, and Biotechnology Applications
معرفی کتاب «Porous Silicon Carbide and Gallium Nitride : Epitaxy, Catalysis, and Biotechnology Applications» نوشتهٔ Randall M. Feenstra; Dr Colin E. C. Wood، منتشرشده توسط نشر Wiley & Sons در سال 2008. این کتاب در فرمت pdf، زبان انگلیسی ارائه شده است.
Like all semiconductors, silicon carbide (SiC) and gallium nitride (GaN) have an energy gap separating the electron energy levels that are normally filled with electrons from those that are normally empty of electrons. Both SiC and GaN have high bond strengths, making them suitable for high-temperature applications. Their wide band gaps also permit a number of novel applications for the materials, including blue and ultra-violet light-emitting devices as well as high-power and high-speed electronic devices. Porous layers of SiC or GaN can be formed by photo-electro-chemical etching, and these porous layers have unique properties and applications such as electronic/optical devices, fuel cells, catalytic sensors, and semipermeable membranes.
The book presents the state-of-the-art in knowledge and applications of porous semiconductor materials having a wide band gap, and the underlying scientific basis for each application area is described. The book starts with an overview of porous wide-band-gap technology. The coverage includes preparation, characterization, morphology and processing of porous SiC, growth of SiC, preparation and properties of porous GaN, growth of GaN, dislocation mechanism GaN films, electrical properties of porous SiC, magnetism of GaN nanostructures, SiC catalysis technology and nanoporous silicon carbide as a biomembrane for medical use.
This book gives both experts and nonexperts a good overview of porous semiconductors. The book is aimed at researchers intending to pursue work relating to porous wide-band-gap semiconductors in the manufacturing/semiconductor industry. It will also appeal to postgraduate students and researchers in materials science, engineering, chemistry, and nanotechnology.
6.3 Epitaxial Lateral Overgrowth of GaN on Porous TiN6.3.1 Formation of Porous TiN; 6.3.2 Growth of GaN on Porous TiN; 6.3.3 Characterization by XRD; 6.3.4 Characterization by TEM; 6.3.5 Characterization by PL; 6.4 Growth of GaN on Porous SiC; 6.4.1 Fabrication of Porous SiC; 6.4.2 GaN Growth on Hydrogen Polished Porous SiC; 6.4.3 GaN Growth on Chemical Mechanical Polished Porous SiC; Acknowledgements; References; 7 HVPE Growth of GaN on Porous SiC Substrates; 7.1 Introduction; 7.2 PSC Substrate Fabrication and Properties; 7.2.1 Formation of Various Types of SPSC Structure; 7.2.2 Dense Layer Porous Silicon Carbide and Gallium Nitride; Contents; Preface; 1 Porous SiC Preparation, Characterization and Morphology; 1.1 Introduction; 1.2 Triangular Porous Morphology in n-type 4H-SiC; 1.2.1 Crystal Anodization; 1.2.2 Description of the Porous Structure; 1.2.3 Model of the Morphology; 1.3 Nano-columnar Pore Formation in 6H-SiC; 1.3.1 Experimental; 1.3.2 Results; 1.3.3 Discussion; 1.4 Summary; Acknowledgements; References; 2 Processing Porous SiC: Diffusion, Oxidation, Contact Formation; 2.1 Introduction; 2.2 Formation of Porous Layer; 2.3 Diffusion in Porous SiC; 2.4 Oxidation 4.2 Creation of Porous GaN by Electroless Etching4.3 Morphology Characterization; 4.3.1 Porous GaN Derived from Unintentionally Doped Films; 4.3.2 Transmission Electron Microscopy (TEM) Characterization; 4.4 Luminescence of Porous GaN; 4.4.1 Cathodoluminescence (CL) of Porous GaN; 4.4.2 Photoluminescence (PL) of Porous GaN; 4.5 Raman Spectroscopy of Porous GaN; 4.5.1 Characteristics of Raman scattering in GaN; 4.5.2 Raman Spectra of Porous GaN Excited Below Band Gap; 4.6 Summary and Conclusions; Acknowledgements; References; 5 Growth of GaN on Porous SiC by Molecular Beam Epitaxy "The book presents the state-of-the-art in knowledge and applications of porous semiconductor materials having a wide band gap, and the underlying scientific basis for each application area is described." "This book gives both experts and nonexperts a good overview of porous semiconductors. The book is aimed at researchers intending to pursue work relating to porous wide-band-gap semiconductors in the manufacturing/semiconductor industry. It will also appeal to postgraduate students and researchers in materials science, engineering, chemistry, and nanotechnology."--Jacket 5.1 Introduction5.2 Morphology and Preparation of Porous SiC Substrates; 5.2.1 Porous Substrates; 5.2.2 Hydrogen Etching; 5.3 MBE Growth of GaN on Porous SiC Substrates; 5.3.1 Experimental Details; 5.3.2 Film Structure; 5.3.3 Film Strain; 5.4 Summary; Acknowledgements; References; 6 GaN Lateral Epitaxy Growth Using Porous SiNx, TiNx and SiC; 6.1 Introduction; 6.2 Epitaxy of GaN on Porous SiNx Network; 6.2.1 Three-step Growth Method; 6.2.2 Structural and Optical Characterization; 6.2.3 Schottky Diodes (SDs) on Undoped GaN Templates; 6.2.4 Deep Level Transition Spectrum Preface. 1. Porous SiC Preparation, Characterization and Morphology 1.1 Introduction 1.2 Triangular Porous Morphology in n-type 4H-SiC. 1.3 Nano-columnar Pore Formation in 6H SiC. 1.4 Summary. Acknowledgements. References. 2. Processing Porous SiC: Diffusion, Oxidation, Contact Formation. 2.1 Introduction. 2.2 Formation of Porous Layer. 2.3 Diffusion in Porous SiC. 2.4 Oxidation. 2.5 Contacts to Porous SiC. Acknowledgments. References. 3. Growth of SiC on Porous SiC Buffer Layers. 3.1 Introduction. 3.2 SiC CVD Growth. 3.3 Growth of 3C-SiC on porous Si via 2.5 Contacts to Porous SiCAcknowledgements; References; 3 Growth of SiC on Porous SiC Buffer Layers; 3.1 Introduction; 3.2 SiC CVD Growth; 3.3 Growth of 3C-SiC on Porous Si via Cold-Wall Epitaxy; 3.3.1 Growth on Porous Si Substrates; 3.3.2 Growth on Stabilized Porous Si Substrates; 3.4 Growth of 3C-SiC on Porous 3C-SiC; 3.4.1 Growth in LPCVD Cold-wall Reactor; 3.5 Growth of 4H-SiC on Porous 4H-SiC; 3.6 Conclusion; Acknowledgements; References; 4 Preparation and Properties of Porous GaN Fabricated by Metal-Assisted Electroless Etching; 4.1 Introduction Porous Silicon Carbide and Gallium Nitride: Epitaxy, Catalysis, and Biotechnology Applications presents the state-of-the-art in knowledge and applications of porous semiconductor materials having a wide band gap. This comprehensive reference beginsÖ≠with an overview of porous wide-band-gap technology, and describes theÖ≠underlying scientific basis for each application area.Ö≠Additional chapters cover preparation, characterization, and topography; processing porous SiC; medical applications; magnetic ion behavior, and many morePorous Silicon Carbide and Gallium Nitride: Epitaxy, Catalysis, and Biotechnology Applications presents the state-of-the-art in knowledge and applications of porous semiconductor materials having a wide band gap. This comprehensive reference beginswith an overview of porous wide-band-gap technology, and describes theunderlying scientific basis for each application area.Additional chapters cover preparation, characterization, and topography; processing porous SiC; medical applications; magnetic ion behavior, and many more