Nanofabrication Using Focused Ion and Electron Beams: Principles and Applications (Oxford Series in Nanomanufacturing)

Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience. Cover 1 Contents 6 Foreword 10 Preface 12 Contributors 14 INTRODUCTION 20 I-1.The Historical Development of Electron Beam Induced Deposition and Etching: From Carbonaceous to Functional Materials 20 I-2. Historical Evolution of FIB Instrumentation and Technology: From Circuit Editing to Nanoprototyping 53 PART I: FUNDAMENTALS AND MODELS 60 1.The Theory of Bright Field Electron and Field Ion Emission Sources 62 2. How to Select Compounds for Focused Charged Particle Beam Assisted Etching and Deposition 125 3. Gas Injection Systems for FEB and FIB Processing Theory and Experiment 143 4. Fundamentals of Interactions of Electrons with Molecules 201 5. Simulation of Focused Ion Beam Milling 243 6. FEB and FIB Continuum Models for One Adsorbate Species 265 7. Continuum Modeling of Electron Beam Induced Processes 303 8. Monte Carlo Method in FEBID Process Simulations 338 PART II: APPLICATIONS 364 9. Focused Electron Beam Induced Processing (FEBIP) for Industrial Applications 366 10. Focused Ion Beam and DualBeamTMTechnology Applied to Nanoprototyping 397 11. Review of FIB Tomography 427 12. In situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing 453 13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles 474 14. Electron- and Ion-Assisted Metal Deposition for the Fabrication of Nanodevices Based on Individual Nanowires 503 15. Focused Ion Beam Fabrication of Carbon Nanotube and ZnO Nanodevices 520 16. Focused Ion and Electron Beam Induced Deposition of Magnetic Nanostructures 532 17. Metal Films and Nanowires Deposited by FIB and FEB for Nanofabrication and Nanocontacting 555 18. FIB Etching for Photonic Device Applications 570 19. FIB etching of InP for Rapid Prototyping of Photonic Crystals 601 20. Applications of FIB for Rapid Prototyping of Photonic Devices, Fabrication of Nanosieves, Nanowires, and Nanoantennas 617 21. Focused Particle Beam Induced Deposition of Silicon Dioxide 634 22. Growth and Characterization of FEB-Deposited Suspended Nanostructures 668 23. Electrical Transport Properties of Metallic Nanowires and Nanoconstrictions Created with FIB 685 24. Structure-Property Relationship of Electronic Transport in FEBID Structures 703 25. Characterization and Modification of Nanostructured Carbon Materials Using FIB and FEB 724 26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes 737 27. Nanofabrication Using Electron Beam Lithography Processes 751 PART III: PROSPECTIVES 770 F-1. Focused Beam Processing—New BeamTechnologies—New Challenges in Process Development and Nanofabrication 772 Index 799 A 799 B 800 C 801 D 803 E 805 F 808 G 811 H 813 I 814 J 816 K 816 L 816 M 817 N 820 O 821 P 821 Q 824 R 824 S 825 T 827 U 829 V 829 W 829 X 829 Y 829 Z 829 __Nanofabrication Using Focused Ion and Electron Beams__ The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience. This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.