Microscopy of semiconducting materials 2001 : proceedings of the Royal Microscopical Society Conference, Oxford University, 25-29 March 2001; MSM XII

"The Institute of Physics Conference Series is a leading International medium for the rapid publication of proceedings of major conferences and symposia reviewing new developments in physics and related areas. Volumes in the series comprise original refereed papers and are regarded as standard referee works. As such, they are an essential part of major libration collections worldwide. The twelfth conference on the Microscopy of Semiconducting Materials (MSM) was held at the University of Oxford, 25-29 March 2001. MSM conferences focus on recent international advances in semiconductor studies carried out by all forms of microscopy. The event was organized with scientific sponsorship by the Royal Microscopical Society, The Electron Microscopy and Analysis Group of the Institute of Physics and the Materials Research Society. With the continual shrinking of electronic device dimensions and accompanying enhancement in device performance, the understanding of semiconductor microscopic properties at the nanoscale (and even at the atomic scale) is increasingly critical for further progress to be achieved. This conference proceedings provides an overview of the latest instrumentation, analysis techniques and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and materials scientists."--Provided by publisher Content: High resolution microscopy and microanalysis self-organized and quantum domain structures epitaxy - growth phenomena epitaxy - wind band-gap nitrides processed silicon, substrates and dielectrics metalization silicides amd contacts device studies and specimen preparation scanning probe microscopy advanced scanning electron and optical microscopy. Part of the "Institute of Physics Conference" series, which publishes proceedings of major conferences and symposia reviewing developments in physics and related areas. This volume contains the proceedings of twelfth conference on the Microscopy of Semiconducting Materials, which focused on the international advances in semiconductor studies. For all professionals in signal processing, parallel and distributed computer architecture, and fault-tolerant computing, this book presents a new distributed multiprocessor architecture which is faster and more versatile than traditional single-processor architectures. ABSTRACT: Recent developments in Schottky field emission scanning transmission electron microscopes now provide the ability to map changes in structure, composition and bonding that occur at materials interfaces and defects on the fundamental atomic scale.