Laser Processing And Diagnostics: Proceedings Of An International Conference, University Of Linz, Austria, July 15-19, 1984 (springer Series In Chemical Physics)

Laser processing is now a rapidly increasing field with many real and potential applications in different areas of technology such as micromechanics, metallurgy, integrated optics, and semiconductor device fabrication. The neces s ity for such soph i st i cated 1 i ght sources as 1 asers is based on the spatial coherence and the monochromaticity of laser light. The spatial coherence permits extreme focussing of the laser light resulting in the availability of high energy densities which can be used for strongly localized heat-and chemical-treatment of materials, with a resolution down to 1 ess than 1 lJIll. When us i ng pul sed or scanned cw-l asers, 1 oca 1 i zat i on in time is also possible. Additionally, the monochromaticity of laser light allows for control of the depth of heat treatment and/or selective, nonthermal bond breaking -within the surface of the material or within the molecules of the surrounding reactive atmosphere -simply by tuning the laser wavelength. These inherent advantages of laser light permit micromachining of materials (drilling, cutting, welding etc.) and also allow single-step controlled area processing of thin films and surfaces. Processes include structural transformation (removal of residual damage, grain growth in polycrystalline material, amorphization, surface hardening etc.), etching, doping, alloying, or deposition. In addition, laser processing is not 1 imited to planar substrates. While other sources of energy such as electron or ion beams, or even incoherent lamps, have shown particular desirability in some processing techniques, there are presently many cases where, because of the abovementioned properties, lasers offer a unique application. The aim of this book is to give an overview of the present understanding of the possibilities and of the limitations of laser processing, with special emphasis on electronic materials. The book is composed of invited reviews and contributed papers, presented duri ng an i nternati onal conference on "Laser Process i ng and Di agnost i cs -Applications in Electronic Materials", held at the Johannes-Kepler-Universittt in Linz, Austria, July 15-19, 1984. This meeting constituted, in essence, the first international conference intended to cover all aspects of laser applications in electronic materials technology, ranging from the fundamentals of the physics and chemistry of laser surface interactions to semiconductor processing and the diagnostics of electronic materials, device properties and semiconductor fabrication processes. The book is divided into five parts. The first part is devoted to the basic interaction mechanisms between laser radiation and sol id surfaces and to applications which are essentially based on rapid thermal heating and v quenching of surfaces (in vacuum or in a non-reactive atmosphere). The second part deals with laser photochemistry of adsorbates and basic molecule-surface interaction mechanisms. Part three gives an overview of both direct writing and large area laser chemical processing including deposition, doping, oxide formation and etching of materials as well as compound formation by mainly pyrolytic or mainly photolytic processes, incorporating laser fabrication and repair of devices. The fourth part summarizes the equally important area of the diagnostics of laser processing and of electronic materials and devices. Finally, the fifth part is devoted to laser diagnostic techniques which allow in situ measurement of temperature and mol ecul ar concentrat i on fi el ds in reacti ve gaseous systems, with special emphasis on those which are relevant to semiconductor fabrication processes. Inevitably, several papers could be equally well fitted into two or more subject categories, and this made classification by chapter very difficult. Therefore, the reader is urged to make use of the comprehens i ve subject index at the end of the book. Furthermore, although some contributions may appear to overlap with others in broad content, the finer details of each will alert the reader to the various perspectives taken by different groups following similar paths. I would like to thank all contributors to the book and especially the invited speakers. All papers in this volume were reviewed by the editor and reviewers, mainly from the international advisory committee, which included Front Matter....Pages I-XI Front Matter....Pages 1-1 Fundamentals of Laser Annealing....Pages 2-13 Inhomogeneous Energy Deposition in Crystalline Silicon with Picosecond Pulses of One Micron Radiation....Pages 14-18 Instabilities of Crystallization in Amorphous Germanium Under Pulsed Laser Irradiation....Pages 19-24 Time Resolved Calorimetry of 30 nm Te-Films During Laser Annealing....Pages 25-28 Pulsed Laser Annealing of GaAs: A Comparison Between Calculation and Experiment....Pages 29-34 Melting Model for UV Lasers....Pages 35-39 Applications of Laser Annealing....Pages 40-49 Optical Regulation Using Crystalline Silicon....Pages 50-53 Optical and Electrical Properties of Laser Annealed Heavily Doped Silicon....Pages 54-60 CW-Laser Annealing of CdTe Epitaxial Layers....Pages 61-66 InSb Optical and Electrical Property Changes Induced by Multi-Pulsed TEA CO 2 -Laser Irradiation....Pages 67-72 Laser Processing in Silicon on Insulator (SOI) Technologies....Pages 73-84 Laser Recrystallisation of Silicon-on-Oxide....Pages 85-89 Fundamentals of Laser Micromachining of Metals....Pages 90-106 Surface Modelling During Laser Microprocessing....Pages 107-113 Front Matter....Pages 115-115 Electronic Structure of Adsorbed Layers....Pages 116-129 Laser Photochemistry of Molecular Systems Involving Gas-Surface Interactions....Pages 130-136 Selective Laser-Induced Heterogeneous Chemistry on Surfaces....Pages 137-142 Spectroscopy of Adsorbates by Transient Laser Calorimetry....Pages 143-147 Laser Vaporization of Clean and CO-Covered Polycrystalline Copper Surfaces....Pages 148-153 Front Matter....Pages 115-115 Laser Investigation of the Dynamics of Molecule-Surface Interactions....Pages 154-163 Front Matter....Pages 165-165 Laser-Induced Chemical Vapor Deposition....Pages 166-182 Structure of Platinum and Tin Films Formed by Laser-Induced Chemical Vapor Deposition....Pages 183-187 Laser Deposition of Single Crystalline GaAs and Stimulated Sheet Doping....Pages 188-196 IR Laser Photo-Assisted Deposition of Silicon Films....Pages 197-204 IR Laser Pyrolysis of Silane....Pages 205-209 Multiphoton Excitation and Dissociation of SiH 4 Exposed to CO 2 Laser Radiation....Pages 210-214 Deposition of Silicon Films by Photodissociation of Silane Under IR Laser Irradiation....Pages 215-220 Characterization of Reactive Intermediates in Silicon Etching and Deposition Using Laser Techniques....Pages 221-224 The Physics of Ultraviolet Photodeposition....Pages 225-233 Low Temperature Growth of HgTe by a UV Photosensitisation Method....Pages 234-238 Applications of Excimer Lasers to Semiconductor Processing....Pages 239-251 Linear-Focused ArF Excimer Laser Beam for Depositing Hydrogenated Silicon Films....Pages 252-256 Analysis of UV Laser-Induced Heterogeneous Deposition: Platinum....Pages 257-262 Laser Photolytic Deposition of Metals on Indium Phosphide....Pages 263-268 Laser Photochemical Deposition of Metals....Pages 269-273 Laser Assisted Pyrolytic Growth and Photochemical Deposition of Thin Oxide Films....Pages 274-287 Laser-Induced Oxidation of Silicon Surfaces....Pages 288-299 Laser-Assisted Chemical Etching of Inorganic Materials: Mechanistic Studies....Pages 300-314 Maskless Dry Etching of GaAs by Focused Laser Beam....Pages 315-319 Front Matter....Pages 165-165 Laser Induced Reduction and Etching of Oxidic Perovskites....Pages 320-322 Laser Enhanced Plating and Etching: A Review....Pages 323-331 Laser Surface Modification Below a Liquid Layer....Pages 332-336 Selectivity of Etching III–V Compounds by Laser-Induced Electrochemistry....Pages 337-338 Photochemical Microetching of InP....Pages 339-342 Ultraviolet Laser Ablation of Organic Polymer Films....Pages 343-354 Laser-Induced Synthesis of Compound Semiconductors....Pages 355-365 Laser Synthesis of Thin Film CuInSe 2 ....Pages 366-369 Metal/Silicon Reactions Using Pulsed Excimer and Ruby Lasers....Pages 370-374 Structural Investigation of Laser Processed PZT Ceramics....Pages 375-378 Light-Induced Sublimation of Cadmium Sulphide....Pages 379-385 Laser Direct Writing Applications....Pages 386-395 Laser Fabrication of Integrated Circuits....Pages 396-416 Front Matter....Pages 417-417 Thermal and Acoustic Techniques for Monitoring Pulsed Laser Processing....Pages 418-424 Temperature Diagnostics for Laser Writing....Pages 425-436 Laser Selective Photoionization Technique: Photoion Beam Epitaxy and Semiconductor Trace Impurity Diagnostics....Pages 437-445 Optical Microanalysis of Device Materials and Structures....Pages 446-457 Laser Diagnostics of Submicron VLSI-Structures....Pages 458-463 Determination of the Mechanical Amplitude Distribution of Quartz Crystal Resonators by Use of a New Noninterferometric Laser Speckle Vibration Measurement System....Pages 464-468 Characterization of Laser Induced Defects in (Al,Ga)As by Photoetching and TEM Measurements....Pages 469-474 Front Matter....Pages 417-417 Optical Characterization of Implantation Damage Recovery and Electrical Activation in GaAs by Raman Scattering....Pages 475-479 Characterization of Gallium Arsenide Layers on Insulators with Germanium Interface Islands....Pages 480-485 Surface-Enhanced Raman Scattering as a Diagnostic Method in Preparing Organic Semiconductor Films....Pages 486-490 Raman-Microsampling Technique Applying Optical Levitation by Radiation Pressure....Pages 491-496 Photothermal Analysis of Thin Films....Pages 497-501 Front Matter....Pages 503-503 Raman Diagnostics of Heterogeneous Chemical Processes....Pages 504-514 Laser Spectroscopy and Gas-Phase Chemistry in CVD....Pages 515-525 Laser Diagnostic Studies of Plasma Etching and Deposition....Pages 526-529 Light Scattering Diagnostics of Gas-Phase Epitaxial Growth (MOCVD-GaAs)....Pages 530-535 On the Generation of C 2 -Radicals by IR-Multiple-Photon Dissociation....Pages 536-541 Back Matter....Pages 543-554 Laser Processing Is Now A Rapidly Increasing Field With Many Real And Potential Applications In Different Areas Of Technology Such As Micromecha Nics, Metallurgy, Integrated Optics, And Semiconductor Device Fabrication. The Neces S Ity For Such Soph I St I Cated 1 I Ght Sources As 1 Asers Is Based On The Spatial Coherence And The Monochromaticity Of Laser Light. The Spatial Coherence Permits Extreme Focussing Of The Laser Light Resulting In The Availability Of High Energy Densities Which Can Be Used For Strongly Loca Lized Heat- And Chemical-treatment Of Materials, With A Resolution Down To 1 Ess Than 1 Ljill. When Us I Ng Pul Sed Or Scanned Cw-l Asers, 1 Oca 1 I Zat I On In Time Is Also Possible. Additionally, The Monochromaticity Of Laser Light Allows For Control Of The Depth Of Heat Treatment And/or Selective, Nonthermal Bond Breaking - Within The Surface Of The Material Or Within The Molecules Of The Surrounding Reactive Atmosphere - Simply By Tuning The Laser Wavelength. These Inherent Advantages Of Laser Light Permit Micromachining Of Materials (drilling, Cutting, Welding Etc.) And Also Allow Single-step Controlled Area Processing Of Thin Films And Surfaces. Processes Include Structural Transformation (removal Of Residual Damage, Grain Growth In Polycrystalline Material, Amorphization, Surface Hardening Etc.), Etching, Doping, Alloying, Or Deposition. In Addition, Laser Processing Is Not 1 Imited To Planar Substrates.