Laser Crystallization of Silicon - Fundamentals to Devices : Laser Crystallization of Silicon : Fundamentals to Devices

This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon. Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry. Valuable applications for industry, particularly in the fabrication of thin-film electronics Each chapter has been peer reviewed An important and timely contribution to the semiconductor literature Content: Contents Pages v-vii List of Contributors Page ix Preface Page xi Chapter 1 Introduction to Laser Crystallization of Silicon Review Article Pages 1-10 Norbert H Nickel Chapter 2 Heat Transfer and Phase Transformations in Laser Melting and Recrystallization of Amorphous Thin Si Films Review Article Pages 11-41 Costas P. Grigoropoulos, Seung-Jae Moon, Ming-Hong Lee Chapter 3 Modeling Laser-Induced Phase-Change Processes: Theory and Computation Review Article Pages 43-78 Robert Černý, Petr Přikryl Chapter 4 Laser Interference Crystallization of Amorphous Films Review Article Pages 79-118 Paulo V Santos Chapter5 Structural and Electronic Properties of Laser-Crystallized Poly-Si Review Article Pages 119-172 Philipp Lengsfeld, Norbert H. Nickel Subject Index Pages 173-177 Contents of Volume Pages 179-201 This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon.
Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry.

Valuable applications for industry, particularly in the fabrication of thin-film electronics
Each chapter has been peer reviewed
An important and timely contribution to the semiconductor literature Reviews the experimental and theoretical studies in the field of laser crystallization of silicon . This work covers the phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon. It also contains applications for industry, particularly in the fabrication of thin-film electronics The field of laser crystallization and laser annealing has its origin in the late 1970s.