High Energy Density Technologies in Materials Science : Proceedings of the 2nd IGD Scientific Workshop, Novara, May 3–4, 1988

Proceedings of the 2nd Scientific Workshop, Novara, May 3-4, 1989 Front Matter....Pages i-x Front Matter....Pages 1-1 Lithography for High Energy Technology in Microelectronics....Pages 3-17 Crosslinking of Industrial Products by High Energy Electron Beams....Pages 19-32 Modification of Surface State of Polymers by Glow Discharge Plasmas....Pages 33-45 Front Matter....Pages 47-47 New Frontiers in Material Processing Using Thermal Plasma Technology....Pages 49-64 Deposition and Etching of Fluoropolymer Films by Plasma Technique....Pages 65-75 Amorphous Carbon Films....Pages 77-87 Materials Processing with Pulsed Electron Beam....Pages 89-103 Ion Beam Treatment of Polymers....Pages 105-113 UV Lasers and Polymers....Pages 115-122 Front Matter....Pages 123-123 Kinetic Aspect of PACVD Modeling....Pages 125-131 Advanced Technologies for ULSI Device Production....Pages 133-138 Design/Operating Parameters Optimization of an Electron Accelerator for Surface Treatments on Materials Through Irradiation....Pages 139-145 CF 4 /O 2 Plasma Etching of Polymers....Pages 147-153 Laser Induced Surface Modification of Polymers....Pages 155-159 Wetting Behavior of Oxygen Plasma Treated PTFE....Pages 161-168 Back Matter....Pages 169-170