Handbook of Ion Beam Processing Technology: Principles, Depostion, Film Modification and Synthesis (Materials Science & Process Technology S.) (Materials Science and Process Technology)
معرفی کتاب «Handbook of Ion Beam Processing Technology: Principles, Depostion, Film Modification and Synthesis (Materials Science & Process Technology S.) (Materials Science and Process Technology)» نوشتهٔ edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman، منتشرشده توسط نشر Noyes Publications [Imprint] در سال 1990. این کتاب در فرمت pdf، زبان انگلیسی ارائه شده است.
Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films. Booknews Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films. Annotation c. Book News, Inc., Portland, OR (booknews.com) MATERIALS SCIENCE AND PROCESS TECHNOLOGY SERIES......Page 3 HANDBOOK OF ION BEAM PROCESSING TECHNOLOGY......Page 4 Contributors......Page 8 Contents......Page 12 1 Perspective on Past, Present and Future Uses of Ion Beam Technology......Page 20 Part I Ion Beam Technology......Page 26 2 Gridded Broad-Beam Ion Sources......Page 27 3 ECR Ion Sources......Page 40 4 Hall Effect Ion Sources......Page 58 5 Ionized Cluster Beam (ICB) Deposition and Epitaxy......Page 77 Part II Sputtering Phenomena......Page 96 6 Quantitative Sputtering......Page 97 7 Laser-Induced Fluorescence as a Tool for the Study of Ion Beam Sputtering......Page 131 8 Characterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization Detection......Page 147 9 The Application of Postionization for Sputtering Studies and Surface or Thin Film Analysis......Page 164 Part III Film Modificaton and Synthesis......Page 188 10 The Modification of Films by Ion Bombardment......Page 189 11 Control of Film Properties by lon-Assisted Deposition Using Broad Beam Sources......Page 213 12 Etching wiith Directed Beams......Page 238 13 Film Growth Modification by Concurrent Ion Bombardment: Theory and Simulation......Page 260 14 Interface Structure and Thin Film Adhesion......Page 298 15 Modification of Thin Films by Off-Normal Incidence Ion Bornbardment......Page 319 16 Ion Beam Interactions with Pollymer Surfaces......Page 334 17 Topography: Texturing Effects......Page 357 18 Methods and Techniques of Ion Beam Processes......Page 381 19 lon-Assisted Dielectric and Optical Coatings......Page 392 20 Diamond and Diamond-like Thin Films by Ion Beam Techniques......Page 434 Index......Page 454 This book covers the range of industrial refractory materials and forms: properties and their measurement, applications, manufacturing, installation and maintenance techniques, quality assurance and statistical process control. Contents: Foundations of Hot Processing; Foundations of Refractory Application; Principles of Thermal Stability; Principles of Corrosion Resistance; The Working Refractory Product Line; The Insulating Refractory Product Line; Refractory Practice Design Properties; Refractory Manufacture; Refractory Installation and Maintenance Encompasses the entire range of industrial refractory materials and forms: properties and their measurement, applications, manufacturing, installation and maintenance techniques, quality assurance, and statistical process control.
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