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Fundamental Physics Of Amorphous Semiconductors: Proceedings Of The Kyoto Summer Institute Kyoto, Japan, September 8-11, 1980 (springer Series In Solid-state Sciences)

معرفی کتاب «Fundamental Physics Of Amorphous Semiconductors: Proceedings Of The Kyoto Summer Institute Kyoto, Japan, September 8-11, 1980 (springer Series In Solid-state Sciences)» نوشتهٔ Hellmut Fritzsche (auth.), Professor Fumiko Yonezawa (eds.)، منتشرشده توسط نشر Springer-Verlag Berlin Heidelberg در سال 1981. این کتاب در فرمت pdf، زبان انگلیسی ارائه شده است.

The Kyoto Summer Institute 1980 (KSI '80), devoted to "Fundamental Physics of Amorphous Semiconductors", was held at Research Institute for Fundamental Physics (RIFP), Kyoto University, from 8-11 September, 1980. The KSI '80 was the successor of the preceding Institutes which were held in July 1978 on "Particle Physics and Accelerator Projects" and in September 1979 on "Physics of Low-Dimensional Systems". The KSI '80 was attended by 200 participants, of which 36 were from abroad: Canada, France, Korea, Poland, U.K., U.S.A, U.S.S.R., and the Federal Republic of Germany. The KSI '80 was organized by RIFP and directed by the Amorphous Semicon­ ductor group in Japan. A few years ago, we started to organize an interna­ tional meeting on amorphous semiconductors' as a satell ite meeting of the International Conference on "Physics of Semiconductors" held on September 1-5, 1980 in Kyoto. We later decided to hold the meeting in the form of the Kyoto Summer Institute. The Kyoto Summer Institute is aimed to be something between a school and a conference. Accordingly, the object of the KSI '80 was to provide a series of invited lectures and informal seminars on fundamental physics of amorphous semiconductors. No contributed paper was accepted, but seminars were open. Front Matter....Pages I-VIII What are Non-Crystalline Semiconductors....Pages 1-13 Defects in Covalent Amorphous Semiconductors....Pages 14-32 Surface Effects and Transport Properties in Thin films of Hydrogenated Silicon....Pages 33-39 The Past, Present and Future of Amorphous Silicon....Pages 40-45 Doping and the Density of States of Amorphous Silicon....Pages 46-55 The Effect of Hydrogen and Other Additives on the Electronic Properties of Amorphous Silicon....Pages 56-71 New Insights on Amorphous Semiconductors from Studies of Hydrogenated a-Ge, a-Si, a-Si 1-x Ge x and a-GaAs....Pages 72-86 Chemical Bonding of Alloy Atoms in Amorphous Silicon....Pages 87-103 Photo-Induced Phenomena in Amorphous Semiconductors....Pages 104-118 Theory of Electronic Properties of Amorphous Semiconductors....Pages 119-144 Some Problems of the Electron Theory of Disorderd Semiconductors....Pages 145-154 The Anderson Localisation Problem....Pages 155-163 Summary Talk....Pages 164-165 Back Matter....Pages 166-184
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