معرفی کتاب «Derivation of the Reflection Equations for Higher-Order Aberrations of Local Wave Fronts by Oblique Incidence» نوشتهٔ Esser, Gregor ;Becken, Wolfgang ;Müller, Werner ;Baumbach, Peter ;Arasa, Josep ;Uttenweiler, Dietmar، منتشرشده توسط نشر Elsevier/Academic Press در سال 2012. این کتاب در فرمت pdf، زبان انگلیسی ارائه شده است.
Advances in Imaging and Electron Physics merges two long-running serials-- Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy . This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Key features: * Contributions from leading authorities * Informs and updates on all the latest developments in the field Content: Editor-in-Chief Page ii Edited by Page iii Copyright page Page iv Preface Pages ix-x Contributors Page xi Future Contributions Pages xiii-xv Chapter 1 - Derivation of the Reflection Equations for Higher-Order Aberrations of Local Wave Fronts by Oblique Incidence Pages 1-39 Gregor Esser, Wolfgang Becken, Werner Müller, Peter Baumbach, Josep Arasa, Dietmar Uttenweiler Chapter 2 - Thermal Imaging in Medicine Pages 41-114 Lila Iznita Izhar, Maria Petrou Chapter 3 - Derivation of the Radiative Transfer Equation in a Medium with a Spatially Varying Refractive Index: A Review Pages 115-143 Jean-Michel Tualle Chapter 4 - Imaging Mass Spectrometry: Sample Preparation, Instrumentation, and Applications Pages 145-193 Kamlesh Shrivas, Mitsutoshi Setou Chapter 5 - Transformation Optics Pages 195-295 Robert T. Thompson, Steven A. Cummer Chapter 6 - TSEM: A Review of Scanning Electron Microscopy in Transmission Mode and Its Applications Pages 297-356 Tobias Klein, Egbert Buhr, Carl Georg Frase Chapter 7 - Logarithmic Image Processing: Additive Contrast, Multiplicative Contrast, and Associated Metrics Pages 357-406 Jourlin Michel, Carré Maxime, Breugnot Josselin, Bouabdellah Mohamed Contents of Volumes 151–170 Pages 407-413 Index Pages 415-423
Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy.
This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Key features:
* Contributions from leading authorities * Informs and updates on all the latest developments in the field
Features articles on the physics of electron devices, particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. This title provides information and updates the developments in the field.