Chemical physics of thin film deposition processes for micro- and nano- technologies : proceedings of the NATO Advanced Study Institute on Chemical Physics of Thin Film Deposition Processes for Micro- and Nano- Technologies, Kaunas, Lithuania, 3 to 14 Sep
معرفی کتاب «Chemical physics of thin film deposition processes for micro- and nano- technologies : proceedings of the NATO Advanced Study Institute on Chemical Physics of Thin Film Deposition Processes for Micro- and Nano- Technologies, Kaunas, Lithuania, 3 to 14 Sep» نوشتهٔ T. E. G. Daenen, D. L. De Kubber (auth.), Yves Pauleau (eds.)، منتشرشده توسط نشر Springer Netherlands : Imprint : Springer در سال 2002. این کتاب در فرمت pdf، زبان انگلیسی ارائه شده است.
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics. Front Matter....Pages i-xiii Electroplating and Electroless Deposition Processes for Electronic Components and Microsystems....Pages 1-17 Self-Assembled Electroactive Ultrathin Films....Pages 19-42 Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials....Pages 43-68 Sol-Gel Deposition Processes of Thin Ceramic Films....Pages 69-89 Thin Film Deposition By Sol-Gel and CVD Processing of Metal-Organic Precursors....Pages 91-118 Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes....Pages 119-144 Chemical Vapor Deposition of Superconductor and Oxide Films....Pages 145-170 Selective Chemical Vapor Deposition....Pages 171-198 Photochemical Vapour Deposition of Thin Films....Pages 199-222 Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures....Pages 223-254 Proximal Probe Induced Chemical Processing for Nanodevice Elaboration....Pages 255-281 Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms....Pages 283-307 Deposition of Thin Films by Sputtering....Pages 309-333 Mass-Transport in an Austenitic Stainless Steel Under High-Flux, Low-Energy Nitrogen Ion Bombardment at Elevated Temperature....Pages 335-360 Back Matter....Pages 361-363 Metallic thin films are deposited with electroplating and electroless processes by electrolysis: metallic ions in an aqueous solution are reduced to metal atoms.
دانلود کتاب Chemical physics of thin film deposition processes for micro- and nano- technologies : proceedings of the NATO Advanced Study Institute on Chemical Physics of Thin Film Deposition Processes for Micro- and Nano- Technologies, Kaunas, Lithuania, 3 to 14 Sep