Advances in Atomic, Molecular, and Optical Physics: Fundamentals of Plasma Chemistry (ISSN Book 43)

This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics. Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments. Content: Editors Page ii Edited by Page iii Copyright page Page iv Contributors Pages ix-x Plasma Processing of Materials and Atomic, Molecular, and Optical Physics. An Introduction Original Research Article Pages 1-17 Hiroshi Tanaka, Mitio Inokuti The Boltzmann Equation and Transport Coefficients of Electrons in Weakly Ionized Plasmas Original Research Article Pages 19-77 R. Winkler Electron Collision Data for Plasma Chemistry Modeling Original Research Article Pages 79-110 W.L. Morgan Electron—Molecule Collisions in Low-Temperature Plasmas: The Role of Theory Original Research Article Pages 111-145 Carl Winstead, Vincent Mckoy Electron Impact Ionization of Organic Silicon Compounds Original Research Article Pages 147-185 Ralf Basner, Martin Schmidt, Kurt Becker, Hans Deutsch Kinetic Energy Dependence of Ion–Molecule Reactions Related to Plasma Chemistry Original Research Article Pages 187-229 P.B. Armentrout Physicochemical Aspects of Atomic and Molecular Processes in Reactive Plasmas Original Research Article Pages 231-241 Yoshihiko Hatano Ion—Molecule Reactions Original Research Article Pages 243-294 Werner Lindinger, Armin Hansel, Zdenek Herman Uses of High-Sensitivity White-Light Absorption Spectroscopy In Chemical Vapor Deposition and Plasma Processing Original Research Article Pages 295-339 L.W. Anderson, A.N. Goyette, J.E. Lawler Fundamental Processes of Plasma—Surface Interactions Original Research Article Pages 341-371 Rainer Hippler Recent Applications of Gaseous Discharges: Dusty Plasmas and Upward-Directed Lightning Original Research Article Pages 373-390,390a,391-398 Ara Chutjian Opportunities and Challenges for Atomic, Molecular, and Optical Physics in Plasma Chemistry Original Research Article Pages 399-406 Kurt Becker, Hans Deutsch, Mitio Inokuti Index Pages 407-414 This series, established in 1965, is concerned with recent developments in the general area of atomic, molecular, and optical physics. The field is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered also include related applied areas, such as atmospheric science, astrophysics, surface physics, and laser physics. Articles are written by distinguished experts who are active in their research fields. The articles contain both relevant review material as well as detailed descriptions of important recent developments