Acta final. Final act

Swift ion beam analysis (IBA) of materials and their surfaces has been widely applied to many fields over the last half century, constantly evolving to meet new requirements and to take advantage of developments in particle detection and data treatment. Today, emerging fields in nanosciences introduce extreme demands to analysis methods at the nanoscale. This book addresses how analysis with swift ion beams is rising to meet such needs. Aimed at early stage researchers and established researchers wishing to understand how IBA can contribute to their analytical requirements in nanosciences, the basics of the interactions of charged particles with matter, as well as the operation of the relevant equipment, are first presented. Many recent examples from nanoscience research are then explored in which the specific analytical capabilities of IBA are emphasized, together with the place of IBA alongside the wealth of other analytical methods. Cover -- Half-Title Page -- Title Page -- Copyright Page -- Contents -- Preamble: Rutherford and IBA -- Introduction -- I.1. Interactions with electrons -- I.2. Elastic scattering from nuclei -- I.3. Nuclear reactions -- 1. Fundamentals of Ion-solid Interactions with a Focus on the Nanoscale -- 1.1. General considerations -- 1.1.1. Wavelengths of ions, electrons and X-rays -- 1.1.2. Penetration depths of ions, electrons and X-rays -- 1.2. Basic physical concepts -- 1.2.1. Energy loss and range of ions in matter -- 1.2.2. Energy straggling -- 1.2.3. Elastic scattering -- 1.3. Channeling, shadowing and blocking -- 1.3.1. Channeling -- 1.3.2. Shadowing -- 1.3.3. Blocking -- 1.4. 1D layers: limits to depth resolution -- 1.5. 2D and 3D objects: aspects of lateral resolution -- 1.5.1. Beam focusing -- 1.5.2. Simulation of nanostructures -- 2. Instruments and Methods -- 2.1. Instruments -- 2.1.1. Accelerators -- 2.1.2. Detectors and data acquisition -- 2.1.3. Analysis chambers -- 2.2. Methods -- 2.2.1. RBS and MEIS -- 2.2.2. ERDA -- 2.2.3. Narrow resonance profiling -- 3. Applications -- 3.1. Example of resonances/light element profiling -- 3.1.1. Introduction -- 3.1.2. Channeling study of the SiO2/Si interface -- 3.1.3. Narrow resonance profiling and stable isotopic tracing studies of the oxidation of silicon -- 3.1.4. Thermal oxidation of silicon carbide -- 3.1.5. Diffusion and reaction of CO in thermal SiO2: transport, exchange and SiC nanocrystal growth -- 3.2. Quantitative analysis/heavy element profiling -- 3.2.1. RBS quantitative analysis of quantum dots and quantum wells -- 3.2.2. CMOS transistors and the race for miniaturization -- 3.3. Examples of HR-ERD analysis -- 3.3.1. Introduction -- 3.3.2. HRBS/HR-ERD comparison -- 3.3.3. HR-ERD profiles of Al2O3/TiO2 nanolaminates -- 3.4. Channeling/defect profiling -- 3.4.1. Introduction Swift ion beam analysis (IBA) of materials and their surfaces has been widely applied to many fields over the last half century, constantly evolving to meet new requirements and to take advantage of developments in particle detection and data treatment. Today, emerging fields in nanosciences introduce extreme demands to analysis methods at the nanoscale. This book addresses how analysis with swift ion beams is rising to meet such needs. Aimed at early stage researchers and established researchers wishing to understand how IBA can contribute to their analytical requirements in nanosciences, the basics of the interactions of charged particles with matter, as well as the operation of the relevant equipment, are first presented. Many recent examples from nanoscience research are then explored in which the specific analytical capabilities of IBA are emphasized, together with the place of IBA alongside the wealth of other analytical methods. -- ISTE, Ltd. website