وبلاگ بلیان

3D IC Stacking Technology

معرفی کتاب «3D IC Stacking Technology» نوشتهٔ Banqiu Wu, Ajay Kumar, Sesh Ramaswami, editors در سال 2011. این کتاب در فرمت epub، زبان انگلیسی ارائه شده است. «3D IC Stacking Technology» در دستهٔ بدون دسته‌بندی قرار دارد.

**The latest advances in three-dimensional integrated circuit stacking technology** With a focus on industrial applications, __3D IC Stacking Technology__ offers comprehensive coverage of design, test, and fabrication processing methods for three-dimensional device integration. Each chapter in this authoritative guide is written by industry experts and details a separate fabrication step. Future industry applications and cutting-edge design potential are also discussed. This is an essential resource for semiconductor engineers and portable device designers. __3D IC Stacking Technology__ covers: - High density through silicon stacking (TSS) technology - Practical design ecosystem for heterogeneous 3D IC products - Design automation and TCAD tool solutions for through silicon via (TSV)-based 3D IC stack - Process integration for TSV manufacturing - High-aspect-ratio silicon etch for TSV - Dielectric deposition for TSV - Barrier and seed deposition - Copper... "The latest advances in three-dimensional integrated circuit stacking technology 3D IC Stacking Technology is a comprehensive resource on three-dimensional stacking technology, including scientific theory, processing methods, applications, and an overview of the industry's technological future. The book is targeted to semiconductor engineers and portable device designers. The quality and functional capabilities of nearly all of today's electronic devices and the production lines that produce them are dependent on key internal semiconductor components--ICs. Lithography and packaging integration are the determining factors in keeping pace with the electronics industry's quest to have more and more transistors on chip product by shrinking ICs and other related products, or by stacking the multiple chips into one chip device. This in-depth volume covers these cutting-edge technologies. 3D IC Stacking Technology Focuses on industrial applications Includes detailed fabrication processes Covers a separate fabrication step in each chapter, written by an industry expert Provides a one-stop knowledge resource for 3D IC technology Discusses future applications and device design potentials Comprehensive coverage: Design challenges; Process sequence integration; TSV etch; Chemical vapor; Barrier/ seed deposition; ECD fill; Chemical mechanical polishing; Wafer thinning; Temporary and permanent bonding; Cost of ownership"-- "This pioneering work explores three-dimensional integrated circuit stacking technology which allows for more transistors on a chip and benefits portable electronics device design with smaller-scale IC, lower power consumption, less heat generation, extended battery life, and lower costs of operation"-- "The latest advances in three-dimensional integrated circuit stacking technology 3D IC Stacking Technology is a comprehensive resource on three-dimensional stacking technology, including scientific theory, processing methods, applications, and an overview of the industry's technological future. The book is targeted to semiconductor engineers and portable device designers. The quality and functional capabilities of nearly all of today's electronic devices and the production lines that produce them are dependent on key internal semiconductor components--ICs. Lithography and packaging integration are the determining factors in keeping pace with the electronics industry's quest to have more and more transistors on chip product by shrinking ICs and other related products, or by stacking the multiple chips into one chip device. This in-depth volume covers these cutting-edge technologies. 3D IC Stacking Technology Focuses on industrial applications Includes detailed fabrication processes Covers a separate fabrication step in each chapter, written by an industry expert Provides a one-stop knowledge resource for 3D IC technology Discusses future applications and device design potentials Comprehensive coverage: Design challenges; Process sequence integration; TSV etch; Chemical vapor; Barrier/ seed deposition; ECD fill; Chemical mechanical polishing; Wafer thinning; Temporary and permanent bonding; Cost of ownership"-- Provided by publisher The latest advances in three-dimensional integrated circuit stacking technology With a focus on industrial applications, 3D IC Stacking Technology offers comprehensive coverage of design, test, and fabrication processing methods for three-dimensional device integration. Each chapter in this authoritative guide is written by industry experts and details a separate fabrication step. Future industry applications and cutting-edge design potential are also discussed. This is an essential resource for semiconductor engineers and portable device designers. 3D IC Stacking Technology covers: High density through silicon stacking (TSS) technology Practical design ecosystem for heterogeneous 3D IC products Design automation and TCAD tool solutions for through silicon via (TSV)-based 3D IC stack Process integration for TSV manufacturing High-aspect-ratio silicon etch for TSV Dielectric deposition for TSV Barrier and seed deposition Copper electrodeposition for TSV Chemical mechanical polishing for TSV applications Temporary and permanent bonding Assembly and test aspects of TSV technology
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